The Bosch Process is a high-aspect ratio etching technology, which repeats the cycle of isotropic etching followed by protection film deposition. The SF6 plasma cycle etches silicon, and the C4F8 plasma cycle creates a protection layer. Combining this process technique with our latest system technology has produced industry leading results for both research and manufacturing customers.
-
DRIE of high aspect ratio 80:1
High aspect ratio Si deep…
-
DRIE of high aspect ratio 50:1
The high aspect ratio of …
-
400 μm depth forward taper etching
This is the forward taper…
-
18 μm/min high rate DRIE …
Products
-
A device that scans space…
-
The RIE-800iPB was used t…
-
Fabrication of a post-column mixer
Preparation of a pillar a…
Products
-
Deep Si etching with an aspect ratio of 23
A high aspect ratio struc…
-
Penetration etching of 500 μm depth
The RIE-400iPB, a silicon…
Products
-
The RIE-400iPB is used to…
Products
-
The RIE-400iPB is used to…
Products