![](https://www.samco.co.jp/en/processes/uploads/filmstress1.jpg)
Stress can be linearly controlled
Results of SiN deposition on a plasma enhanced CVD system for mass production. There is no stress change after annealing and a wide process window and control range is achieved.
Results of SiN deposition on a plasma enhanced CVD system for mass production. There is no stress change after annealing and a wide process window and control range is achieved.