Samco is proud to announce our involvement in the 11th Asia-Pacific Conference on Plasma Science and Technology (11th APCPST), to be held at Kyoto University in October 2012. A total of seven research papers by several Samco R&D personnel and collaborating researchers will be presented during the conference. Four of these research papers were developed in collaboration with the Tokyo Institute of Technology, Kyushu Institute of Technology, University of Tokushima, Yamaguchi University, and the Dalian University of Technology. The research papers are listed below, in order of presentation.
"Material Synthesis and Plasma Etching" session on October 3, 2012
- A Study of Via Hole Etching for TSV Process
- Microfabrication of Si Based Microchannel for Transport of Bacterial Cells by Ar/F2 Vapor Etching and Cl2 Inductively Coupled Plasma Etching
- Preparation and Properties of Silicon Carbon Nitride Films Deposited at 1000 °C by Self-biased RF PECVD
- SiOC Deposition Using Cathode Coupled PECVD by Liquid Source Materials
- Realization of Scallop-less Si Deep Trench Structure by Bosch Process and F2 + He ICP Etching
"Various Applications of Plasmas" session on October 4, 2012
6. GaN MOSFET with Coron Trichloride-based Dry Recess Process
"General" session on October 5, 2012
7. InGaN-based High-Efficiency Light-Emitting Diodes on Patterned Sapphire Substrate with Nano-structure Nanoimprint Lithography and Inductive Coupled Plasma Reactive Ion Etching.
Samco would like to cordially invite all interested parties to attend these research presentations. We look forward to connecting with you at APCPST 2012.