Samco's President (Mr Osamu Tsuji) and the Director of U.S. Operations (Mr Peter Wood) visited MIT* and the Princeton Institute for the Science and Technology of Materials** (PRISM) at Princeton University in November 2008 to further strengthen mutual technical collaborations.

MIT installed Samco ICP plasma etching system in October 2008. Both the ICP plasma etching and silicon DRIE systems are currently scheduled for installation by February 2009 at PRISM.

Samco has entered into technical collaboration agreements with universities and other educational institutions for many years. Recently, Samco has further decided to intensify its research collaborations through its new relationships with Dr Gale Petrich of MIT and Professor James C. Sturm of PRISM.

Such technical collaborations are incredibly beneficial to both parties. Samco provides the universities with the best tools and process knowledge, while the universities provide Samco with feedback on the applications and new research developments. This technical collaboration allows Samco to continually improve its technology to offer the next generation of semiconductor process equipment.

* M.I.T. (web.mit.edu/cbegroup/www)
** PRISM (prism.princeton.edu)