![](https://www.samco.co.jp/products/process/uploads/parylene.jpg)
Isotropic etching of Si sacrifice layer
The amorphous silicon as a sacrificial layer was isotropically etched with a xenon fluoride (XeF₂) etching device, and a movable parylene body floating 1 μm from the substrate was fabricated.
Photo courtesy of Kansai University
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