![](https://www.samco.co.jp/en/processes/uploads/filmstress2.jpg)
Repeatability of me film stress at long intervals
SiN deposition characteristics in a plasma enhanced CVD system for mass production. We have achieved a stable SiN film formation with no stress change over a long period of time.
Tweet
SiN deposition characteristics in a plasma enhanced CVD system for mass production. We have achieved a stable SiN film formation with no stress change over a long period of time.