![](https://www.samco.co.jp/products/process/uploads/quartz_150um.jpg)
Deep etching of 150 μm of quartz by ICP etching system. The mask is Ni, and an etching rate of 400 nm/min has been achieved.
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Deep etching of 150 μm of quartz by ICP etching system. The mask is Ni, and an etching rate of 400 nm/min has been achieved.