![](https://www.samco.co.jp/products/process/uploads/64c5d270e6fd570971c544df77b200d83a4df0d7.jpg)
A smooth pillar, 0.7 µm in diameter and 4 µm deep, with vertical, no sidewall roughness, has been formed. Also, there is no roughness at the bottom.
This process can be applied to semiconductor lasers and photonic crystals.
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A smooth pillar, 0.7 µm in diameter and 4 µm deep, with vertical, no sidewall roughness, has been formed. Also, there is no roughness at the bottom.
This process can be applied to semiconductor lasers and photonic crystals.